Tergeo Plasma System – a cost-effective, versatile solution for plasma etching and cleaning in research and development. With fully automatic system control ensuring consistent, repeatable results, the Tergeo system can generate a wide range of plasma—including oxygen, argon, ambient air, nitrogen, hydrogen, SF6, water vapor, and more—to remove both hydrocarbon and inorganic surface contaminants efficiently. Its advanced capabilities not only clean and activate surfaces but also enhance bonding strength, boost surface energy, and render samples hydrophilic, making it an ideal choice for precise surface preparation and modification.