| Chromium | Aluminum | Gold |
| Indium Tin oxide | Platinum | Nickel |
| Tin | Silver | Titanium |
| Thickness range | Varies depending on metal |
| Thickness tolerance | +/- 5% |
| Sides processed | One |
| Gases | Nitrogen, Argon |
| Wafer size | 100 mm, 150 mm, 200 mm |
| Wafer material | Silicon, Silicon on Insulator, Quartz |
| Wafer thickness | Semi standard |
| Within wafer uniformity | +/- 5% or better |
| Wafer to wafer uniformity | +/- 5% or better |
| Chromium | Aluminum | Gold |
| Indium Tin oxide | Platinum | Nickel |
| Tin | Silver | Titanium |
| Thickness range | Varies depending on metal |
| Thickness tolerance | +/- 5% |
| Sides processed | One |
| Gases | Nitrogen, Argon |
| Wafer size | 100 mm, 150 mm, 200 mm |
| Wafer material | Silicon, Silicon on Insulator, Quartz |
| Wafer thickness | Semi standard |
| Within wafer uniformity | +/- 5% or better |
| Wafer to wafer uniformity | +/- 5% or better |
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